Chemija / Chemistry
 ISSN 0235-7216 ISSN 2424-4538 (online) |
2010 m. Nr. 1 Nanoporous alumina formation in a thin magnetron-sputtered
Al layer
The magnetron sputtering technique was used for thin Al layer formation on Si wafers. The parameters of the sputtering process were experimentally estimated. The substrate temperature range of 9–12 °C was determined as most favorable for the deposition of uniform Al coatings. Thin, porous alumina layers with pore diameters close to 10–15 nm were formed by galvanostatic oxidation of sputtered coatings in an oxalic acid solution. A porous layer thickness of 40–60 nm was evaluated as close to that minimally needed for the further surface finishing. Keywords: nanoporous alumina, thin layers, anodizing, magnetron sputtering, scanning electron microscopy |
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