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Chemija / Chemistry

ISSN 0235-7216
ISSN 2424-4538 (online)

2010 m. Nr. 2-4

An XPS and AFM study of Ar+-ion etched Ni–W alloy surfaces, prepared by DC magnetron sputtering
Vitalija JASULAITIENĖ, Rokas KONDROTAS, Vidas PAKŠTAS, Povilas MIEČINSKAS

The surface of Ni–W alloy coatings deposited by direct-current (DC) reactive magnetron sputtering before and after annealing was examined by X-ray photoelectron spectroscopy (XPS) and with the atomic force microscope (AFM). The XPS depth profiles of as-deposited Ni–W alloys with a different content of W (25, 50 and 75 at. %) show the compositional and chemical shifts indicating an obvious increase of W content in all sputtering depth due to preferential Ni sputtering. The binding energy (BE) of Ni2p3 peaks increases with increasing the tungsten content in the alloy, while the binding energy of W4f7 peaks decreases with decreasing the nickel content; this reflects the well-known alloying effect on the chemical shifts. The heating (T = 850 ºC in H2) of as-sputtered Ni–W alloys shows that W is preferentially oxidized and causes the crystalline structure and a remarkable coarsening of alloy surfaces.

Keywords: Ni–W alloys, heat treatment, XPS, AFM, Ar+ ion etching

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